email: elyse@uiuc.edu
Research Interests:
Elyse Rosenbaum received the B.S. degree (with distinction) from
Cornell University in 1984, the M.S. degree from Stanford University
in 1985, and the Ph.D. degree from University of California, Berkeley
in 1992, all in electrical engineering.
From 1984 through
1987 she was a Member of Technical Staff at AT&T Bell Laboratories in
Holmdel, NJ. She is presently Professor of
Electrical and Computer Engineering at the University of Illinois
at Urbana-Champaign.
Dr. Rosenbaum has been the recipient of a Best Student Paper Award
from the IEDM, a Technical Excellence Award from the SRC, an
NSF Career Award, and an IBM Faculty Award. She is a Senior Member of the IEEE. She is an editor
for IEEE Transactions on Device and Materials Reliability, a
web-based journal available free of charge to all IEEE members -
http://ieeexplore.ieee.org.
Dr. Rosenbaum frequently lectures on subjects related to on-chip ESD
protection; she has has taught tutorials and short courses
at venues including the EOS/ESD
Symposium, International Reliability Physics Symposium,
and RFIC Conference.
K. Bhatia, S. Hyvonen and E. Rosenbaum, "A compact, ESD-protected, SiGe BiCMOS LNA for ultra-wideband applications," IEEE Journal of
Solid-State Circuits, vol.42, no. 5, pp.1121-1130, 2007.
J. Li, S. Joshi, R. Barnes and E. Rosenbaum, "Compact modeling of on-chip ESD protection devices using Verilog-A," IEEE Trans. CAD, vol. 25, no. 6, pp. 1047-1063, 2006.
H. Li, C. Zemke, G. Manetas, V. Okhmatovski, E. Rosenbaum and A. Cangellaris,"An automated and efficient substrate noise analysis tool,"IEEE Trans. CAD., vol. 25, no. 3, pp.454-468, 2006.
J. Di Sarro and E. Rosenbaum, "A scalable SCR compact model for ESD circuit simulation," accepted for presentation at 2008 IEEE Int. Rel. Phys. Symp.
F. Farbiz and E. Rosenbaum, "Modeling of majority and minority carrier triggered external latchup," accepted for presentation at 2008 IEEE Int. Rel. Phys. Symp.
F. Farbiz and E. Rosenbaum, "An investigation of external latchup," Proc. IEEE Int. Rel. Phys. Symp, pp. 600-601, 2007.
J. Di Sarro, K. Chatty, R. Gauthier and E. Rosenbaum, "Evaluation of SCR-based ESD protection devices in 90nm and 65nm CMOS technologies," Proc. IEEE Int. Rel. Phys. Symp, pp. 348-357, 2007.
F. Farbiz and E. Rosenbaum, "Analytical modeling of external latchup," EOS/ESD Symp. Proc., pp. 338-346, 2007.
A. Gerdemann, K. Bhatia, E. Rosenbaum, "A Kelvin transmission line pulsing system with optimized oscilloscope ranging," EOS/ESD Symp. Proc., pp. 80-88, 2007.
K. Bhatia and E. Rosenbaum, "Layout guidelines for optimized ESD protection diodes," EOS/ESD Symp. Proc., pp. 19-27, 2007.
A. Gerdemann, E. Rosenbaum and M. Stockinger, "A novel testing approach for full-chip CDM characterization," EOS/ESD Symp. Proc., pp. 289-296, 2007.
K. Bhatia, S. Hyvonen and E. Rosenbaum, "An 8-mW, ESD-protected, CMOS LNA for ultra-wideband applications," Proc. IEEE Custom Integrated Circuits Conf., pp. 385-388, 2006.
K. Bhatia, K. Kim, C.-T. Chuang, E. Rosenbaum, J.-O. Plouchart,
and B. Floyd, "Double-gate FET technology for RF applications:
device characteristics and low noise amplifier design," Proc. IEEE International SOI Conference, pp. 75-76, 2006.
J. Di Sarro, K. Chatty, R. Gauthier and E. Rosenbaum,
"Study of design factors affecting the turn-on time of silicon controlled
rectifiers (SCRs) in 90 and 65 nm bulk CMOS technologies,"
Proc. IEEE Int. Rel. Phys. Symp., pp. 163-168, 2006.
V. Chen, A. Salman, S. Beebe, E. Rosenbaum, S. Mitra, C. Putnam, R. Gauthier,
"SOI poly-defined diode for ESD protection in high speed I/Os," Proc. IEEE Int. Rel. Phys. Symp., pp. 635-636, 2006.
S. Hyvonen, K. Bhatia and E. Rosenbaum, "An ESD-protected 2.45/5.25-GHz dual-band CMOS LNA with series LC loads and a 0.5-V supply," IEEE RFIC Symposium, pp. 43-46, 2005.
E. Rosenbaum and S. Hyvonen, "On-chip ESD protection for RF I/Os: devices,
circuits and models," Proceedings International Symposium on Circuits and
Systems, pp. 1202-1205, 2005.
S. Joshi, S. Hyvonen and E. Rosenbaum, "High-Q ESD protection devices for use at RF and broadband I/O pins,"
IEEE Trans. Elec. Dev., vol. 52, no. 7, pp. 1484-1488, 2005.
J. Li, H. Li, R. Barnes and E. Rosenbaum, "Comprehensive study of drain
breakdown in MOSFETs," IEEE. Trans. Elec. Dev., vol. 52, no. 6, pp. 1180-1186, 2005.
S. Hyvonen and E. Rosenbaum, "Diode-based tuned ESD protection for 5.25-GHz CMOS LNAs," Proc. EOS/ESD Symposium, pp. 9-17, 2005.
S. Joshi, R. Ida and E. Rosenbaum, "Design and optimization of vertical SiGe thyristors for on-chip ESD protection," IEEE Trans. Device and Materials Reliability, vol. 4, no. 4, pp. 586-593, 2004.
J. Wu and E. Rosenbaum, "Gate oxide reliability under ESD-like pulse stress,"
IEEE Trans. on Electron Devices, vol. 51, no. 7,
pp. 1192-1196, 2004. Paper was printed with incorrect art. Corrected
version was published in no. 9, pp. 1528-1532.
R. Kanj and E. Rosenbaum, "A critical evaluation of SOI design guidelines,"
IEEE Trans. on VLSI Systems, vol. 12, no. 9, pp. 885-894, 2004.
S. Hyvonen, S. Joshi, and E. Rosenbaum, "Combined TLP/RF Testing System
for Detection of ESD Failures in RF Circuits,"
IEEE Transactions on Electronics
Packaging Manufacturing, vol. 28, no. 3, pp. 224-230, 2005.
S. Hyvonen, S. Joshi, and E. Rosenbaum, "Comprehensive ESD Protection
for RF inputs," Micro. Rel., vol. 45, pp. 245-254, 2005.
J. Li, S. Hyvonen and E. Rosenbaum,
"Improved wafer-level VFTLP system and investigation of device
turn-on effects," Proc. EOS/ESD Symp., pp. 331-337, 2004.
J. Li, R. Gauthier and E. Rosenbaum, "A compact, timed-shutoff,
MOSFET-based power clamp for on-chip ESD protection,"
Proc. EOS/ESD Symp., pp. 273-279, 2004.
R. Kanj, T. Lehner, B. Agrawal and E. Rosenbaum, "Noise
characterization of static CMOS gates,"
Proc. of 41st IEEE/ACM Des. Automat. Conf , pp. 888-893, 2004.
S. Joshi and E. Rosenbaum, "ESD protection for broadband
ICs (DC-20 GHz and beyond)," Elec. Lett., vol. 39, no. 12,
pp. 906-908, 2003.
S. Joshi and E. Rosenbaum,
"Simulator-independent compact modeling of vertical npn
transistors for ESD and RF circuit simulation,"
Micro. Rel., vol. 43, pp. 1021-1027, 2003.
J. Li, S. Joshi and E. Rosenbaum,
"A Verilog-A compact model for ESD protection NMOSTs,"
Proc. IEEE Custom Integrated Circuits Conf., pp. 253-256, 2003.
S. Joshi, R. Ida and E. Rosenbaum, "A study of vertical SiGe
thyristor design and optimization," Proc.
EOS/ESD Symp., pp. pp. 224-232, 2003.
S. Hyvonen, S. Joshi and E. Rosenbaum, "Comprehensive ESD protection
for RF Inputs," Proc. EOS/ESD Symp., pp. 188-194, 2003.
S. Joshi and E. Rosenbaum, "Transmission line pulsed waveform
shaping with microwave filters," Proc.
EOS/ESD Symp., pp. 364-371, 2003.
S. Hyvonen, S. Joshi and E. Rosenbaum, "Combined TLP/RF
testing system for detection of ESD failures in RF circuits,"
Proc. EOS/ESD Symp., pp. 346-353, 2003.
S. Hyvonen, S. Joshi and E. Rosenbaum, "A cancellation
technique to provide ESD protection for multi-GHz RF inputs,"
Electronics Letters, vol. 39, no. 3, pp. 284-286, 2003.
H. Li, J. Carballido, H. Yu, V. Okhmatovski, E. Rosenbaum and
A. Cangellaris, "Comprehensive frequency-dependent substrate
noise analysis using boundary element methods,"
Proc. ICCAD, pp. 2-9, Nov. 2002.
R. Kanj, E. Rosenbaum and T. Lehner, "Bipolar leakage modeling
for switch-level simulators," Proc.
IEEE International SOI Conference, pp. 147-149, Oct. 2002.
S. Joshi and E. Rosenbaum, "Compact modeling of vertical ESD protection
npn transistors for RF circuits,"
EOS/ESD Symposium, pp. 289-295, Oct. 2002.
R. Kanj and E. Rosenbaum, "A critical look at design guidelines for
SOI logic gates," IEEE Int. Symp.
on Circuits and Systems, vol. 3, pp. 261-264, 2002.
P. Juliano and E. Rosenbaum, "A novel SCR macromodel for ESD circuit
simulation," Int. Electron Devices Meeting Tech. Dig., pp. 319-322, 2001.
P. Juliano and E. Rosenbaum, "Accurate wafer-level measurement
of ESD protection device turn-on using a modified very
fast transmission line pulse system,"
IEEE Trans. Device and Materials Reliability,
vol.1, no. 2, pp. 95-103, 2001.
Y. Wang, P. Juliano, S. Joshi and E. Rosenbaum, "Electrothermal
model for simulation of bulk-Si and SOI diodes in ESD protection
circuits," Micro. Rel., vol. 41, no. 11, pp. 1781-1787, 2001.
J. Wu, P. Juliano, E. Rosenbaum, "Breakdown and latent damage
of ultra-thin gate oxides under ESD stress conditions," Micro.
Rel., vol. 41, no. 11, pp. 1771-1779, 2001.
R. Kanj and E. Rosenbaum, "Multiple output domino logic (MODL)
in SOI," Proc. IEEE Int. SOI Conf., pp. 59-60, 2001.
E. Li, E. Rosenbaum, J. Tao and P. Fang "Projecting lifetime
of deep submicron MOSFETs," IEEE Trans.
Elec. Dev., vol. 48, no.4, pp. 671-678, 2001.
S. Joshi, R. Ida, P. Givelin and E. Rosenbaum, "An analysis
of bipolar breakdown and its application to the design of ESD
protection circuits," Proc. Int. Rel. Phys. Symp., pp. 240-245, 2001.
E. Rosenbaum and J. Wu, "Trap generation and breakdown processes
in very thin gate oxides," Microelectronics Reliability, vol. 41, no. 5,
pp. 625-632, 2001. (Invited Paper)
Y. Wang, P. Juliano, S. Joshi and E. Rosenbaum, "Electrothermal
modeling of ESD diodes in bulk-Si and SOI technologies,"
Proc. EOS/ESD Symp., pp. 430-436, 2000.
J. Wu, P. Juliano and E. Rosenbaum, "Breakdown and latent damage
of ultra-thin gate oxides under ESD stress conditions, Proc.
EOS/ESD Symp., pp. 287-295, 2000.
S. Voldman, P. Juliano, N. Schmidt, R. Johnson, L. Lanzerotti, A. Joseph,
C. Brennan, J. Dunn, D. Harame, E. Rosenbaum and B. Meyerson,
"Electrostatic discharge characterization of epitaxial-base
silicon-germanium heterojunction bipolar transistors,"
Proc. EOS/ESD Symp., pp. 239-250, 2000.
S. Joshi, P. Juliano, E. Rosenbaum, G. Kaatz and S. M. Kang, "ESD protection
for BiCMOS circuits," Proc. Bipolar/BiCMOS Circuits and Tech. Mtg.,
pp. 218-221, 2000.
E. Rosenbaum and J. Wu, "Present understanding of gate oxide wearout,"
Proc. European Solid-State Device Research Conf., pp.54-59, 2000.
E. Li, E. Rosenbaum, L. F. Register, J. Tao and P. Fang,
"Hot carrier induced degradation in deep submicron MOSFETs
at 100 C," Proc. Intl. Rel. Phys. Symp., pp. 103-107, 2000.
J. Wu, E. Rosenbaum, B. MacDonald, E. Li, J. Tao, B. Tracy and P. Fang,
"Anode hole injection versus hydrogen release: the mechanism
for gate oxide breakdown," Proc.
Intl. Rel. Phys. Symp., 27-32, 2000.
S. Voldman, P. Juliano, R. Johnson, N. Schmidt, A. Joseph,
S. Furkay, E. Rosenbaum, J. Dunn, D. Harame and B. Meyerson,
"Electrostatic discharge and high current pulse characterization
of epitaxial-base Silicon-Germanium heterojunction bipolar
transistors," Proc. Intl. Rel. Phys. Symp., pp. 310-316, 2000.
D. Chen, E. Li, E. Rosenbaum and S. M. Kang, "Interconnect
Thermal Modeling for Accurate Simulation of Circuit
Timing and Reliability," IEEE Trans. CAD IC and Syst, vol. 19,
no. 2, pp. 197-205, 2000.
D. Chen, E. Li, E. Rosenbaum and S. M. Kang, "Interconnect thermal
modeling for determining design limits on current density,"
Int. Symp. on Physical Design, p. 172, 1999.
E. Li, E. Rosenbaum, J. Tao, G. Yeap, M.-R. Lin and P. Fang,
"Hot carrier effects in nMOSFETS in 0.1um CMOS technology,"
Intl. Rel. Phys. Symp, p. 253, 1999.
J. Wu, L. F. Register, and E. Rosenbaum, "Trap assisted tunneling
current through ultra-thin oxide,"
Intl. Rel. Phys. Symp, p. 389, 1999.
P. Raha, C. Diaz, E. Rosenbaum, M. Cao, P. VandeVoorde,
and W. Greene, "EOS/ESD reliability of partially-depleted
SOI technology," IEEE Trans. on Electron Devices, vol. 46,
no. 2, p. 429, 1999.
L. F. Register, E. Rosenbaum and K. Yang, "Analytic model for direct
tunneling current in polycrystalline silicon-gate
metal-oxide-semiconductor devices," Applied Physics Letters,
vol. 74, no. 3, p. 457, 1999.
P. Raha, J. Smith, J. Miller and E. Rosenbaum, "ESD robustness
prediction and protection device design in partially-depleted
SOI technology," Microelectronics Rel. J., vol. 38, no. 11, p. 1723, 1998.
Y.-K. Cheng, P. Raha, C.-C. Teng, E. Rosenbaum and S. M. Kang,
"ILLIADS-T: An electrothermal timing simulator for temperature
profiling of VLSI chips,"
IEEE Trans. on CAD of Ckts. and Syst., vol. 17, no. 8, pp. 668-681, 1998.
E. Li, E. Rosenbaum, J. Tao and P. Fang, "CMOS hot carrier lifetime
improvement from deuterium anneal," Device Research Conf., pp. 22-23, 1998.
T. Li, C.-H. Tsai, E. Rosenbaum and S,-M. Kang, "Substrate resistance
modeling and circuit-level simulation of parasitic device coupling effects
for CMOS I/O circuits under ESD stress,"
EOS/ESD Symp. Proc., pp. 281-289, 1998.
T. Li, C.-H. Tsai, E. Rosenbaum and S.-M. Kang,
"Modeling, extraction and simulation of CMOS I/O circuits under ESD stress,"
IEEE Int'l Symposium on Circuits and Systems, pp. 389-392, 1998.
T. Li, P. Bendix, D. Suh, Y. J. Huh, E. Rosenbaum, A. Kapoor
and S. M. Kang, "Optimum Design for a Two-Stage CMOS I/O ESD
Protection Circuit," IEEE
IEEE International Symposium on
Circuits and Systems, pp. 113-116, 1998.
C.-C. Teng, Y.-K. Cheng, E. Rosenbaum and S. M. Kang, "iTEM: A temperature
dependent electromigration reliability diagnosis tool,"IEEE Trans. on CAD of Int. Ckts. and Syst., vol. 16, no. 8, pp. 882-894.
P. Raha, J. Miller and E. Rosenbaum, "Time-dependent snapback in
thin film SOI MOSFETs, IEEE Electron Device Letters, vol. 18, no. 11,
p.509, 1997.
P. Raha, J. Smith, J. Miller and E. Rosenbaum, "Prediction of ESD protection
levels and novel protection devices in thin film SOI technology,"
1997 EOS/ESD Symposium Proc., p. 356, 1997.
T. Li, D. Suh, S. Ramaswamy, P. Bendix, E. Rosenbaum, A. Kapoor,
and S. M. Kang, "Study of a deep-submicron I/O protection circuit
using circuit-level simulation," Int. Reliability Physics
Symp. Proc., p. 333, 1997.
T. Li, S. Ramaswamy, E. Rosenbaum and S. M. Kang, "Circuit-level
simulation and layout optimization for deep submicron EOS/ESD
output protection device," IEEE Custom Integrated Circuits Conf.,
p. 159, 1997.
P. Raha, S. Ramaswamy and E. Rosenbaum, "Heat flow analysis
for EOS/ESD protection device design in SOI technology,"
IEEE Trans. on Electron Devices, vol. 44, no. 3, p. 464, 1997.
E. Rosenbaum and L. F. Register, "Mechanism of stress-induced leakage
current in MOS capacitors," IEEE Trans. on Electron Devices,
vol. 44, no. 2, p. 317, 1997.
E. Rosenbaum, J. King and C. Hu, "Accelerated
testing of SiO2 reliability," IEEE Trans. on
Electron Devices, vol. 43, no. 1, p. 70, January
1996.
C. Teng, Y. Cheng, E. Rosenbaum and S.
Kang, "iTEM: A chip-level electromigration
reliability diagnosis tool using electrothermal
timing simulation,"
Int. Reliability Physics
Symp. Proc., p. 172, 1996.
Y. Cheng, C. Teng, A. Dharchoudhury, E.
Rosenbaum and S. Kang, "iCET: A complete
chip-level thermal reliability diagnosis tool for
CMOS VLSI chips,"
33rd Design Automation Conference, p. 548, 1996.
C. Teng, Y. Cheng, E. Rosenbaum and S.
Kang, "Hierarchical electromigration reliability
diagnosis for VLSI interconnects,"
33rd Design Automation
Conf., p. 752, 1996.
S. Ramaswamy, E. Li, E. Rosenbaum and S.
Kang, "Circuit-level simulation of CDM-ESD
and EOS in submicron MOS devices,"
EOS/ESD Symp. Proc., p. 316, 1996.
Y. Cheng, C. Teng, A. Dharchoudhury, E. Rosenbaum and S. Kang,
"Improvement on chip-level electrothermal simulator - ILLIADS-T,"
Proc. ISCAS, p. 432, 1996.
Y. Cheng, C. Teng, A. Dharchoudhury, E. Rosenbaum and
S. Kang, "A chip-level electrothermal simulator for
temperature profile estimation of CMOS VLSI chips,"
Proc. ISCAS, p. 580, 1996.
S. Ramaswamy, P. Raha, E. Rosenbaum and S.
Kang, "EOS/ESD protection circuit design for
deep submicron SOI technology," EOS/ESD
Symp. Proc., p. 212, 1995.
E. Minami, S. Kuusinen, E. Rosenbaum, P. Ko
and C. Hu, "Circuit-level simulation of TDDB
failure in digital CMOS circuits," IEEE Trans.
on Semiconductor Manufacturing, vol. 8, no. 3,
p. 370, 1995.
C. Felsch and E. Rosenbaum, "The relation
between oxide degradation and oxide
breakdown," Int. Reliability Physics Symp.
Proc., p. 142, 1995.
W. Sun, E. Rosenbaum and S. Kang, "Fast
timing simulation for submicron hot-carrier
degradation," Int. Reliability Physics Symp.
Proc., p. 65, 1995.
E. Rosenbaum, Z. Liu and C. Hu, "Silicon
dioxide breakdown lifetime enhancement under
bipolar bias conditions," IEEE Trans. on
Electron Devices, vol. 40, no. 12, p. 2287,
1993.
K. Quader, C. Li, R. Tu, E. Rosenbaum, P. Ko
and C. Hu, "A bi-directional NMOSFET
current reduction model for simulation of hot-
carrier-induced circuit degradation," IEEE
Trans. on Electron Devices, vol. 40, no. 12, p.
337, 1993.
R. Tu, E. Rosenbaum, W. Chan, C. Li, E.
Minami, K. Quader, P. Ko and C. Hu,
"Berkeley reliability tools - BERT," IEEE
Trans. on CAD of Integrated Circuits and
Systems, vol. 12, no. 10, 1993.
E. Rosenbaum, Z. Liu and C. Hu, "The effects
of oxide stress waveform on MOSFET
performance," Int. Electron Devices Mtg. Tech.
Dig., p. 719, 1991.
Z. Liu, E. Rosenbaum, P. Ko, C. Hu, Y. Cheng,
C. Sodini, J. Gross and T. Ma, "A comparative
study of the effects of dynamic stressing on
high-field endurance of reoxidized-nitrided,
fluorinated and conventional oxides," Int.
Electron Devices Mtg. Tech. Dig., p. 723,
1991.
K. Quader, C. Li, R. Tu, E. Rosenbaum, P. Ko
and C. Hu, "A new approach for simulation of
circuit degradation due to hot-electron damage
in NMOSFETs," Int. Electron Devices Mtg.
Tech. Dig., p. 337, 1991.
E. Rosenbaum, R. Rofan and C. Hu, "Effect of
hot-carrier injection on n- and pMOSFET gate
oxide integrity," IEEE Electron Device Ltr.,
vol. 12, no. 11, p. 599, 1991.
E. Rosenbaum and C. Hu, "High-frequency
time-dependent breakdown of SiO2," IEEE
Electron Device Ltr., vol. 12, no. 6, p. 267,
1991.
E. Rosenbaum, R. Moazzami and C. Hu,
"Implications of waveform and thickness
dependence of SiO2 breakdown on accelerated
testing," Proc. of the Int. Symp. on VLSI Tech.,
Systems, and Applications, p. 214, 1991.
E. Rosenbaum, P. Lee, R. Moazzami, P. Ko and
C. Hu, "Circuit reliability simulator - oxide
breakdown module," Int. Electron Devices Mtg.
Tech. Dig., p. 331, 1989.
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